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Electrode-stress-induced nanoscale disorder in Si quantum electronic devices

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Disorder in the potential-energy landscape presents a major obstacle to the more rapid development of semiconductor quantum device technologies. We report a large-magnitude source of disorder. beyond commonly considered unintentional background doping or fixed charge in oxide layers: nanoscale strain fields induced by residual stresses in nanopatterned metal gates. Quantitative analys... https://pipingrockers.shop/product-category/inosine/
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